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PE/CVD Furnace

Chemical Vapour Deposition (CVD) is a process used to deposit thin films of materials on a substrate. In CVD, a chemical reaction takes place between gaseous precursors and a heated substrate, resulting in the growth of a thin film. CVD furnaces provide a controlled environment for this process, allowing precise control of the deposition process and the properties of the resulting film.

Plasma Enhanced Chemical Vapour Deposition (PECVD) is a variant of CVD that uses a plasma to enhance the chemical reaction. In PECVD, a plasma is generated in the furnace, creating highly reactive species that can interact with the precursors to promote more efficient reactions and improve film growth. The result is thinner, more uniform films with improved physical and electrical properties. PECVD furnaces provide a powerful solution for a wide range of applications, including the deposition of thin films for electronic devices and optical coatings.

Across International Australia is a supplier of CVD and PECVD furnaces. It offers a range of high quality advanced furnaces designed for use in a wide range of industrial applications, including thin film deposition for electronic devices and optical coatings.

Browse here for a range of Laboratory PE/CVD Furnaces